3M™ Wetordry™ Polishing Paper 281Q is comprised of micron graded aluminum oxide and silicon carbide particles that is slurry coated

3M™ Wetordry™ Polishing Paper 281Q is comprised of micron graded aluminum oxide and silicon carbide particles that is slurry coated

3M™ Wetordry™ Polishing Paper 281Q is comprised of micron graded aluminum oxide and silicon carbide particles that is slurry coated

3M™ Wetordry™ Polishing Paper 281Q is comprised of micron graded aluminum oxide and silicon carbide particles that is slurry coated

3M™ Polishing Film 961M with plain back is comprised of resilient fibers coated onto a polyester film backing, this non-abrasive

3M™ Polishing Film 491X with plain back is comprised of micron graded mineral that has been coated onto a fibrous

3M™ Polishing Film 291X with plain back is comprised of micron graded mineral that has been coated onto a fibrous

3M™ Polishing Film 591X with plain back is comprised of micron graded mineral that has been coated onto a fibrous

3M™ Lapping Film 869XW has a higher mineral content than 863X, making it more aggressive for faster polishing. It’s designed

3M™ Lapping Film 869X provides super fiber height control, but polishes more slowly than 863XW. It uses on most polishing machines and

3M™ Lapping Film 863XW has a higher mineral content than 863X, making it more aggressive for faster polishing. It’s designed

3M™ Lapping Film 863X provides super fiber height control, but polishes more slowly than 863XW. It uses on most polishing machines and