AETP’s microwave(2.45Ghz) plasma system has a higher plasma density versus than RF(13.56Mhz) plasma type in vacuum chamber. Generated plasma particle by microwave has superb isotropic moving that can make significantly less shadow phenomenon, also they do not need antena at inside chamber. And extremely little temperature increase after plasma treatment. In addition, our AVP series can be setted with variety option like as RF source, turn table, rotation drum, heating plate, additioinal MFC, etc. AVP system basicly provide a MFC that can use clean compressed air for surface activation of organic substances and surface cleaning of inorganic substances. Even with big chamber and many options, AVP system can provided reasonable price for customer.
FEATURES:
Supply the optimal system that reflects the customer’s position
Good alternative for the application that couldn’t use air and flame plasma
